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材料简介
Introduction
FLH321HS材料,具有气泡少、纯度高,几乎无包裹物、耐高温性能等特性,
广泛的应用于半导体先进制程、光学、化学加工、紫外线和高温窗口等。
Thanks to the few bubbles, high purity, almost no inclusion,
high temperature resistant performance and other characteristics,
FLH321HS has been widely used in semiconductor advanced manufacturing,
optical, chemical processing, UV and high temperature window.
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